exposure factorとは 意味・読み方・使い方

As the exposure function, the relation between the reflection factor, exposure, and pattern width is determined by using previously many wafers to calculate it by performing multi-regression analyses.例文帳に追加

露光量関数は、予め多くのウェハを用いて、反射率と露光量とパターン幅との関係を求め、重回帰分析して算出する。 - 特許庁

To suppress deterioration of image quality caused by exposure processing according to a factor with time.例文帳に追加

経時的な要因により露光処理によって形成される画像の品質が劣化するのを抑制する。 - 特許庁

To provide a method for scanning exposure by which multiple exposure can be performed even by means of a step-and-scan projection aligner and the coherence factor and exposure of a lighting system can be adjusted at every focal point needed for optimizing the multiple exposure and, in addition, the accuracy of pattern transfer can be improved.例文帳に追加

ステップアンドスキャン方式においても多重露光を行うことができ、且つ多重露光の最適化に必要な焦点位置毎の照明系のコヒーレンシーファクタや露光量の調整を行うことができ、パターン転写精度の向上をはかる。 - 特許庁

In addition, an exposure optical system in the individual project exposure device 10 is provided with a plurality of the illumination unevenness compensation filters 40 having a transmission factor distribution opposite to a proper illumination distribution.例文帳に追加

また、個々の投影露光装置１０の露光光学系に固有の照度分布とは反対の透過率分布を有する複数の照度むら補正フィルタ４０を備える。 - 特許庁

To provide an electronic camera that enables the user to clearly understand the effect of automatic shift photographing, by which exposure factor is changed.例文帳に追加

オートシフト撮影においていずれの露出因子を変更したことによる効果であるかが明確に分かるようにする。 - 特許庁

The imaging apparatus is also provided with an amplification factor control means (122) to switch or change the distribution between an amplification factor of the first amplifying means and an amplification factor of the second amplifying means in accordance with photographing conditions, such as the temperature of the imaging element and exposure time.例文帳に追加

そして増幅率制御手段（１２２）を設け、撮像素子の温度や露光時間等の撮影条件に応じて第一の増幅手段の増幅率と第二の増幅手段の増幅率の配分を切り替え又は変更する。 - 特許庁

A control portion 17 inputs to itself the reflection factor and desired pattern width of a wafer which is measured by a reflection factor measuring device 20 before applying a photoresist to the wafer, and computes the exposure by using the exposure function stored in the exposure function storing portion 18 to control the power to be fed to a light source 11.例文帳に追加

制御部１７は、反射率測定装置２０で測定したフォトレジスト塗布前のウェハの反射率と所望のパターン幅とを入力し、露光量関数記憶部１８に記憶されている露光量関数を用いて露光量を演算して、光源１１に供給される電力を制御する。 - 特許庁

To provide an imaging apparatus which can obtain an excellent exposure not depending upon the reflection factor of a subject and a stable exposure reduced in the influence of an error in light emission quantity.例文帳に追加

被写体の反射率に依存しない良好な露出と発光量の誤差の影響を低減した安定した露出を得ることを可能とした撮像装置を提供する。 - 特許庁