small chamber methodとは 意味・読み方・使い方

To sufficiently secure an effective volume capable of being utilized for the storage of ice in an ice storage chamber by a method wherein an ice making small chamber is constituted so as to be opened and closed by moving a water pan into up-and-down directions.例文帳に追加

水皿を上下方向に移動して製氷小室の開閉を行なう構成とすることにより、貯氷室における貯氷に供し得る有効容積を充分に確保する。 - 特許庁

This production method includes supplying micro-bubbles of an oxygen-containing gas, which have a very small bubble diameter and a large surface area, to a cathode chamber 4 of a diaphragm-containing electrolysis tank 3 which has a diaphragm 8 between the cathode chamber 4 and an anode chamber 5; and generating the rinse water containing hydrogen peroxide in the cathode chamber 4.例文帳に追加

気泡径が非常に小さく、表面積が大きい酸素含有ガスのマイクロバブルを、陰極室４と陽極室５との間に隔膜８を有する有隔膜電解槽３の陰極室４に供給し、陰極室４で過酸化水素含有洗浄水を生成する。 - 特許庁

The method is applicable to a small drop emitter which has a liquid-filled chamber including a nozzle, a thermal actuator for pressuring a liquid at the nozzle, and the like.例文帳に追加

ノズルを含む液体充填チャンバと、該ノズルにて液体を加圧する熱式アクチュエータなどとを有する小滴エミッタに適用できる。 - 特許庁

To offer a medical purpose double chamber vessel in which when a small vessel for housing a medicament, etc. in addition to a storing chamber is used, its unsealing can be easily and consistently performed and its production method.例文帳に追加

収納室以外に薬剤を収納する小容器等を用いる場合、その開封を容易に、しかも確実に行うことができる医療用複室容器及びその製造方法を提供する。 - 特許庁

To provide a compact vacuum film-forming device in which the atmosphere in the film-forming chamber can be decompressed rapidly by making the volume of the film-forming chamber small, a manufacturing method of a thin film element, and an electronic equipment.例文帳に追加

成膜室の容積を小さくして同成膜室の雰囲気を速く減圧にすることのできるコンパクトな真空成膜装置、薄膜素子の製造方法及び電子機器を提供する。 - 特許庁

To provide a plasma CVD system and method having small impurity contamination and high productivity by increasing a speed of chamber cleaning and optimizing a cleaning frequency.例文帳に追加

チャンバクリーニングの速度を増加させ、クリーニング頻度を最適化することにより不純物汚染が少なく生産性が高いプラズマCVD装置及び方法を与える。 - 特許庁

To provide a plasma treatment apparatus that reduces foreign objects in a reaction chamber and has a small amount of variation in machining shape, and to provide a treatment method using the plasma treatment apparatus, and the manufacturing method of semiconductor devices.例文帳に追加

反応室内の異物の低減が図られ、加工形状のばらつきの少ないプラズマ処理装置、プラズマ処理装置を用いた処理方法および半導体装置の製造方法を提供する。 - 特許庁

To provide a deaeration method and a deaeration device adopting a tubular deaeration chamber having small diameter and small volume as a substitute for a tank and effective at a technical area requiring sanitation environment such as drink industry.例文帳に追加

タンクに代えて小径少容量のチュウブ状の脱気室を採用し、飲料産業等衛生環境を必要とする技術分野において有効な脱気方法および脱気装置ならびにその洗浄装置を提供する。 - 特許庁