「film of」に関連した英語例文の一覧と使い方(14ページ目) - Weblio英語例文検索

METHOD OF CLEANING COMPONENT OF FILM DEPOSITION APPARATUS例文帳に追加

成膜装置部品の洗浄方法 - 特許庁

METHOD OF MANUFACTURING THIN FILM OF TITANIUM OXIDE例文帳に追加

酸化チタン薄膜の製造方法 - 特許庁

FORMATION METHOD OF SILICON OXIDE FILM, FORMATION METHOD OF SILICON NITRIDE FILM, AND FORMATION METHOD OF SILICON OXYNITRIDE FILM例文帳に追加

シリコン酸化膜の形成方法、シリコン窒化膜の形成方法、シリコン酸窒化膜の形成方法 - 特許庁

MANUFACTURING METHOD OF POROUS FILM, THE POROUS FILM, AND SOLUTION OF PRECURSOR COMPOSITION OF THE POROUS FILM例文帳に追加

多孔質膜の作製方法、多孔質膜、及び多孔質膜の前駆体組成物の溶液 - 特許庁

METHOD FOR PRODUCING FILM OF NOBLE METAL, OXIDE FILM OF NOBLE METAL, AND SILICIDE FILM OF NOBLE METAL例文帳に追加

貴金属膜、貴金属酸化物膜、および貴金属ケイ化物膜の製造方法 - 特許庁

Whether the film quality is satisfactory or not is evaluated on the basis of the measured value of the obtained film formation speed of the SiO_2 film.例文帳に追加

そして、得られたＳｉＯ_2膜の成膜速度の実測値から膜質の良否を評価する。 - 特許庁

Secondly, forming of the thin film is started (S2), and the physical thickness of the thin film in the middle of the film formation is detected (S3).例文帳に追加

次に、薄膜の成膜を開始し（Ｓ２）、成膜途中で薄膜の物理膜厚を検知する（Ｓ３）。 - 特許庁

To provide a film splicing method and a film splicing device capable of preventing interruption of the feed of a film.例文帳に追加

フィルムの供給を中断させないフィルム継ぎ方法及び装置を提供する。 - 特許庁

The treatment of changing an adhesive force of the Al film 23 to be a substrate of the Au film 24 and a protective film 25 is executed.例文帳に追加

Ａｕ膜２４の下地となるＡｌ膜２３や保護膜２５の密着力を変える処理を行う。 - 特許庁

FORMATION OF THIN FILM OUT OF POWDER COATING MATERIAL AND FORMATION OF COATING FILM USING THIN FILM例文帳に追加

粉体塗料による薄膜形成方法、及び前記薄膜を用いた皮膜形成方法 - 特許庁

Upon receiving the information, the control unit 3 finds the rate of change of the film thickness of the thin film based on the film thickness information.例文帳に追加

これを受けた制御部３は膜厚情報に基づき薄膜の膜厚変化率を求める。 - 特許庁

ACCELERATED TESTING METHOD OF STAIN OF COATING FILM AND EVALUATION METHOD OF ANTI-STAINING PROPERTIES OF COATING FILM例文帳に追加

塗膜の汚れ促進試験方法及び塗膜の耐汚れ性評価方法 - 特許庁

In this electromagnetic wave shielding film, a shielding function film 5 constituted of a multilayer lamination film of a metal oxide film 2, a metal film 3 and a metal oxide film 2 is formed on the whole part of a single surface of a transparent film 1, and the surface of the film 5 is covered with a protective film 9.例文帳に追加

透明フィルム１の片面全体に、金属酸化物膜２と金属膜３と金属酸化物膜２との多層積層膜からなるシールド機能膜５が形成され、さらに上記シールド機能膜５の表面が保護フィルム９で被覆されてなる電磁波シールドフィルムである。 - 特許庁

METHOD OF MANUFACTURING SEMICONDUCTOR THIN FILM AND THIN FILM SEMICONDUCTOR ELEMENT AND PEELING DEVICE OF SEMICONDUCTOR THIN FILM例文帳に追加

半導体薄膜の製造方法、薄膜半導体素子の製造方法及び半導体薄膜の剥離装置 - 特許庁

FILM FORMATION METHOD OF SILICON NITRIDE FILM, FILM FORMATION DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE例文帳に追加

シリコン窒化膜の成膜方法、成膜装置、及び半導体装置の製造方法 - 特許庁

MANUFACTURING METHOD OF FERROELECTRIC FILM, MANUFACTURING METHOD OF ELEMENT USING PIEZOELECTRIC FILM, AND FILM FORMATION DEVICE例文帳に追加

強誘電体膜の製造方法、圧電膜を用いた素子の製造方法および成膜装置 - 特許庁

OXIDE COMPOSITE FILM, COATING LIQUID FOR FORMING THE FILM, METHOD OF MANUFACTURING THE COATING LIQUID AND METHOD OF FORMING THE FILM例文帳に追加

酸化物複合膜、該膜形成用塗布液、該塗布液の製造方法及び該膜の造膜方法。 - 特許庁

COMPOSITION FOR FORMATION OF POROUS FILM, PRODUCTION OF COMPOSITION, PROCESS FOR FORMING POROUS FILM AND POROUS FILM例文帳に追加

多孔質膜形成用組成物、該組成物の製造方法、膜の形成方法および多孔質膜 - 特許庁

To form a semiconductor thin film having excellent homogeneity of each of a film composition structure and a film thickness.例文帳に追加

膜組織構造の均質性及び膜厚の均質性に優れた半導体薄膜を形成する。 - 特許庁

The first film thickness measuring mechanism 104 measures the film thickness of a film deposition layer at a plurality of positions.例文帳に追加

第１膜厚測定機構１０４は、複数の位置における成膜層の膜厚を測定する。 - 特許庁

POLYESTER FILM USED FOR BACK PROTECTION FILM OF SOLAR CELL AND BACK PROTECTION FILM OF SOLAR CELL例文帳に追加

太陽電池裏面保護膜用ポリエステルフィルムおよび太陽電池裏面保護膜 - 特許庁

METHOD OF REPAIRING COATING FILM AND BASE MATERIAL HAVING COATING FILM OBTAINED BY METHOD OF REPAIRING COATING FILM例文帳に追加

塗膜の補修方法及び塗膜の補修方法により得られる塗膜を有する基材 - 特許庁

SEMICONDUCTOR THIN FILM, LAMINATE OF SEMICONDUCTOR THIN FILM, AND MANUFACTURING METHOD OF SEMICONDUCTOR THIN FILM例文帳に追加

半導体薄膜、半導体薄膜の積層体、半導体薄膜の製造方法 - 特許庁

To prevent a barrier metal film of wiring formed in a recess of an insulating film from being peeled off from the insulating film.例文帳に追加

絶縁膜の凹部内に形成された配線のバリアメタル膜の絶縁膜からの剥がれを防ぐ。 - 特許庁

All the displacement sections 5, 6, 9, and 10 are made of a double film of a lower SiN film and an upper Al film.例文帳に追加

変位部５，６，９，１０は全て、下側のＳｉＮ膜と上側のＡｌ膜との２重膜からなる。 - 特許庁

To obtain the spatial distribution of film thickness of an insulation thin film inside a measurement area subjected to film thickness measurement.例文帳に追加

膜厚測定の対象測定領域内の絶縁性薄膜の膜厚の空間分布を得る。 - 特許庁

To keep film quality of a plated film in fat wiring good while keeping flatness of the plated film.例文帳に追加

めっき膜の平坦性を保ちつつ、太幅配線におけるめっき膜の膜質を良好に保つ。 - 特許庁

PARTICLE JET FILM DEPOSITION SYSTEM FOR CONTINUOUS FILM DEPOSITION OF FOIL SUBSTRATE, AND CONTINUOUS FILM DEPOSITION METHOD OF FOIL SUBSTRATE例文帳に追加

箔基材連続成膜の微粒子噴射成膜システム及び箔基材連続成膜方法 - 特許庁

Surface of the TiN film is nitrided 103 prior to formation of the TiN film (barrier metal film) 104.例文帳に追加

また、ＴｉＮ膜（バリアメタル膜）１０４を形成する前に、ＴｉＮｘ膜の表面を窒化１０３する。 - 特許庁

The physical film thickness of the metal oxide film 26 is thicker than that of the metal oxide film 24b.例文帳に追加

金属酸化膜２６の物理膜厚は、金属酸化膜２４ｂの物理膜厚よりも厚い。 - 特許庁

A film thickness of the insulting film 5 is set larger than that of the gate insulating film 6.例文帳に追加

絶縁膜５はゲート絶縁膜６よりも膜厚が厚く設定されている。 - 特許庁

Furthermore, a film-forming method of film-forming a thin film having a smaller content of impurities is obtained.例文帳に追加

また、該不純物の含有量が少ない薄膜を成膜する成膜方法を提供できる。 - 特許庁

To provide a film forming method of a conductive zinc film capable of depositing a conductive zinc film having high temporal stability at low cost.例文帳に追加

経時安定性の高い導電性酸化亜鉛膜を低コストに成膜する。 - 特許庁

END FACE PROCESSING METHOD OF THIN FILM GLASS, THIN FILM GLASS, AND END FACE PROCESSOR OF THIN FILM GLASS例文帳に追加

薄膜ガラスの端面処理方法、薄膜ガラス、及び薄膜ガラスの端面処理装置 - 特許庁

Furthermore, a fusing point of the heat absorption film 108 is higher than those of the Al film 107 and the protecting film 109.例文帳に追加

また、熱吸収膜１０８の融点は、Ａｌ膜１０７及び保護膜１０９の融点より高い。 - 特許庁

To provide a thin film depositing apparatus and a thin film depositing method capable of suppressing generation of irregularity in film thickness.例文帳に追加

膜厚ムラの発生を抑制できる薄膜形成装置及び薄膜形成方法を提供する。 - 特許庁

The cramping wrinkles of the soft film are corrected by applying a stretching force to the soft film 27 in the feed direction of the soft film.例文帳に追加

ツレシワは、軟膜２７の搬送方向に延伸力を加えることで矯正する。 - 特許庁

MEASURING METHOD OF HARDENING RATE OF DIMMING FILM, MANUFACTURING METHOD FOR DIMMING FILM, AND DIMMING FILM例文帳に追加

調光フィルムの硬化率の測定方法、調光フィルムの製造方法、及び調光フィルム - 特許庁

THIN FILM PATTERNING METHOD, METHOD OF MANUFACTURING THIN FILM DEVICE AND METHOD OF MANUFACTURING THIN FILM MAGNETIC HEAD例文帳に追加

薄膜パターニング方法、薄膜デバイスの製造方法及び薄膜磁気ヘッドの製造方法 - 特許庁

METHOD OF PRODUCING ORGANIC SILICONE POLYMER, COMPOSITION FOR FILM FORMING, METHOD OF FORMING FILM AND SILICIC FILM例文帳に追加

有機ケイ素系重合体の製造方法、膜形成用組成物、膜の形成方法およびシリカ系膜 - 特許庁

To provide a film laminating device which does not require any matured skill and enables easy registering of the positions of a front side film and a back side film by adjustment.例文帳に追加

熟練したスキルを必要とせず、容易に表、裏側フィルムを位置合わせ調整する。 - 特許庁

To provide a device of sticking optical film and a method of sticking optical film which can restrain air from entering between a display panel and an optical film.例文帳に追加

表示用パネルと光学フィルムとの間に空気が入り込むのを抑制する。 - 特許庁

The base film 6 is formed by combining a step of normal incidence film formation, and a step of oblique-incidence film formation.例文帳に追加

該下地膜６は、直入射成膜工程と斜入射成膜工程とを組み合わせて成膜する。 - 特許庁

CHARGE CONVERTING FILM, PRODUCTION PROCESS OF CHARGE CONVERTING FILM AND PRODUCTION APPARATUS OF CHARGE CONVERTING FILM例文帳に追加

荷電変換膜、荷電変換膜の製造方法、及び荷電変換膜の製造装置 - 特許庁

METHOD OF CLEANING THIN FILM DEPOSITION DEVICE, METHOD OF THIN FILM DEPOSITION, AND THIN FILM DEPOSITION DEVICE例文帳に追加

薄膜形成装置の洗浄方法、薄膜形成方法、及び、薄膜形成装置 - 特許庁