後弾性膜の英語

一対の前フィルム基板２１と後フィルム基板２２のそれぞれの対向する面に、高弾性を有する透明なポリウレタン系樹脂でなる前緩衝膜２３、後緩衝膜２４が表示領域全体に形成する。例文帳に追加

A front buffer film 23 and a back buffer film 24 both consisting of a transparent polyurethane resin having high elasticity are formed on the opposite faces of a pair of front film substrate 21 and back film substrate 22, respectively, in the whole display region. - 特許庁

弾性表面波共振器アルミニウム蒸着膜、アルミニウム合金蒸着膜のすだれ状櫛形電極形成後の弾性表面波共振器チップ分割における圧電性基板の注水冷却式ダイシングに先立ち、アルミニウム蒸着膜、アルミニウム合金蒸着膜のすだれ状櫛形電極形成圧電性基板表面に予め保護膜を形成したものである。例文帳に追加

A protection film is preliminarily formed on the surface of a piezoelectric substrate after the formation of an interdigital electrode such as an aluminum deposition film and an aluminum alloy evaporation film prior to the water injection cooling type dicing of the piezoelectric substrate at the time of surface acoustic wave resonator chip division after the formation of the interdigital electrode such as the surface acoustic wave resonator aluminum deposition film or an aluminum alloy deposition film. - 特許庁

硬化前の貯蔵弾性率が１０^３〜１０^６Ｐａであり、硬化後の貯蔵弾性率が１０^７〜１０^１１Ｐａである硬化性の接着剤層１１と、保護シート１２とを備えた光ディスク製造用シート１を、光ディスク基板２に形成された反射膜３上に積層する。例文帳に追加

This sheet 1 for manufacturing an optical disk, which is provided with a curable adhesive layer 11 whose storage elastic modulus before curing is 10^3 to 10^6 Pa and whose storage storage elastic modulus after curing is 10^7 to 10^11 Pa and a protective sheet 12, is laminated on a reflection film 3 formed on an optical disk substrate 2. - 特許庁

この状態で、配線膜１３が弾性変形し、かつ圧縮応力が働く温度領域で第１の熱処理を施し、その後配線膜１３が塑性変形する温度領域で第２の熱処理を施す。例文帳に追加

In this state, the wiring film 13 is elastically deformed, a first heat treatment is performed in a temperature range where a compression stress works, and thereafter, a second heat treatment is performed in a temperature range where the wiring film 13 is plastically deformed. - 特許庁

弾性膜５０（二酸化シリコン膜５１）上に、ジルコニウム層を熱酸化して酸化ジルコニウムからなる絶縁体膜５５を形成し、その後、ジルコニウム層を熱酸化する際の最高温度以下の温度で、絶縁体膜５５をアニール処理する。例文帳に追加

An insulator film 55 consisting of zirconium oxide is formed on an elastic layer 50 (silicon dioxide film 51) by carrying out thermal oxidation of a zirconium layer, and then annealing of the insulator film 55 is carried out at a temperature below the highest temperature when thermal oxidation of the zirconium layer is carrier out. - 特許庁

低熱伝導性弾性ローラを成形するために、外壁が無機質材料からなる中空フィラーを含有した液状ゴム混合物を弾性層の形成材料に用いた場合において、円筒状基材周面に均一な膜厚を形成するための安定した吐出と、塗膜硬化後に平滑な表面性が得られる製造方法の提供。例文帳に追加

To provide a manufacturing method that obtains stable discharge for the formation of a film of uniform thickness on the periphery of a cylindrical substrate and a smooth surface after the curing of a coating film, in the case where a liquid rubber mixture containing hollow filler that has an external wall made of an inorganic material is used as a material for forming an elastic layer, in order to mold an elastic roller of low thermal conductivity. - 特許庁

圧電基板１上に電極パッドの第１の電極層２ａをエッチングにより形成し、第１の電極層２ａを形成した後に、弾性表面波素子用電極５ａをリフトオフ法により形成し、しかる後電極パッドの第２の電極層７ａ及び配線電極７ｂを有する電極膜を形成する、弾性表面波装置の製造方法。例文帳に追加

In the method of manufacturing the surface acoustic wave device, first electrode layers 2a on the electrode pad are formed on the piezoelectric substrate 1 through etching operation; after the layers 2a have been formed, electrodes 5a for a surface acoustic wave element are formed by the lift-off method; and an electrode film which comprises second electrode layers 7a and wiring electrodes 7a on the electrode pad are formed. - 特許庁

また、ロッド５の先端部には、前側加振プレート９及び後側加振プレート１０が取付けられ、それらの間には弾性体であるゴム膜１１が挟着されている。例文帳に追加

Furthermore, a front side shaking plate 9 and a rear side shaking plate 10 are attached to the tip of the rod 5 and a rubber membrane 11 being an elastic body is inserted between them. - 特許庁