re-crystallizationとは 意味・読み方・使い方

When the temperature of the resin reaches a prescribed temperature (for example 100°C) higher than the re-crystallization temperature and not exceeding the melting temperature, the resin is kept at that temperature for several-several tens seconds (step S3).例文帳に追加

結晶性熱可塑性樹脂が、再結晶化温度よりも高く融解温度以下の所定の温度（例えば１００℃）に達したら、その温度で数秒から数十秒程度保持する（ステップＳ３）。 - 特許庁

The method for producing the absorber includes a step of reacting an isatoic anhydride with an approximately stoichiometric amount of an acylating compound, where the isatoic anhydride is purified by re-crystallization or other purification method.例文帳に追加

更に、再結晶もしくは他の精製法により精製されるイサト酸無水物を、化学量論的適量のアシル化化合物と反応させる段階を含んで成る、これらの化合物の製法。 - 特許庁

To provide an electrode for a discharge lamp and its manufacturing method obtained by joining an electrode tip part with a high purity a rod material part which is superior in strength and also in impact resistance after re- crystallization.例文帳に追加

本発明は、純度の高い電極先端部と再結晶後の強度、耐衝撃性も優れた棒材部分を接合して得られる放電灯用電極及びその製造方法を提供することを目的とする。 - 特許庁

On an insulating substrate 1, a backing oxide film 2 and an a-Si film 3 are formed, impurity ions are implanted, laser light is irradiated for melting/re-crystallization, and thus a p-type polycrystalline silicon film 3 is formed and machined into an island shape.例文帳に追加

絶縁基板１の上に下地酸化膜２とａ−Ｓｉ膜３を成膜し、不純物イオンを打ち込み、レーザ光を照射して溶融・再結晶化し、ｐ型の多結晶シリコン膜３を生成、島状に加工する。 - 特許庁

The problems are solved by forming the head of an electrode for a discharge lamp and the foot holding the head and thinner than the foot into a jointless integral structure, and by using a tungsten based material having a re-crystallization temperature of 2,000°C or higher as a material for the structure.例文帳に追加

放電灯用電極の頭部と、頭部を保持する頭部より細い足部とを継ぎ目のない一体構造とし、その材質を再結晶温度が２０００℃以上のタングステン系材料とすることで解決した。 - 特許庁

To provide a bismuth-base glass composition which can be well softened in heat treatment such as sealing and can crystallize satisfactorily after being softened and which is little re-softened after crystallization in heat treatment such as evacuation.例文帳に追加

熱処理工程、例えば封着工程で良好に軟化するとともに、軟化後に十分に結晶が析出し、しかも結晶析出後の熱処理工程、例えば真空排気工程で再軟化し難いビスマス系ガラス組成物を得ること。 - 特許庁

Moreover, in the case where the amorphous whose crystal grain sizes are small or fine crystal grain size hetero semiconductor is formed as the hetero semiconductor region, it is allowable that re-crystallization annealing process may be conducted after formation of the film to generate polycrystal silicon from the hetero semiconductor region.例文帳に追加

さらには、前記ヘテロ半導体領域として非晶質もしくは微結晶のヘテロ半導体を成膜させた場合、成膜後に、多結晶シリコンに変化させる再結晶化アニール処理を施すようにしても良い。 - 特許庁

In this manufacturing method, before depositing a tension impartable insulation film, a film mainly consisting of zinc phosphate of ≥ 0.1 g/m^2 and ≤ 10 g/m^2 per one side of the steel sheet is deposited on the grain-oriented silicon steel plate subjected to the secondary re-crystallization.例文帳に追加

張力付与性絶縁皮膜の形成に先立ち、二次再結晶済みの一方向性珪素鋼板に対し、鋼板片面当たり０．１ｇ／ｍ^2以上１０ｇ／ｍ^2以下のリン酸亜鉛を主体とする皮膜を形成させる。 - 特許庁