performing without a maskとは 意味・読み方・使い方

To provide a mask for efficiently performing ventilation without leaking pressure when a tube for tubal feeding, etc., is used in the mask of an invasive artificial respirator by solving the problem that all non-invasive artificial respirators are operated by pressure setting so as to prevent effective ventilation from being attained by leaking the pressure from the tube.例文帳に追加

すべての非侵襲的人工呼吸器は圧設定にて作動するため、圧がチューブの部位より漏れ出ることで効果的な換気を行うことが出来ない。 - 特許庁

To provide a mask auxiliary tool for smoothly performing respiration and a conversation by using an original mask of a type available on the market and covering both a mouth and a nose without impairing the mask function of preventing drying of the nose and the inflow of dust or pollen.例文帳に追加

鼻の乾燥や、埃又は花粉等の流入を防ぐといったマスクの機能を損なうことなく、市販されている口と鼻との両方を覆うタイプのマスクをそのまま利用して、呼吸や会話を円滑に行うことを可能とするマスク補助具を提供する。 - 特許庁

To provide a pattern inspection method and a pattern inspection device for constantly performing accurate pattern inspection to a body to be inspected without being affected by the optical system characteristics or the like of a sensor, and a method for manufacturing a mask.例文帳に追加

センサの光学系特性等に影響されず、被検査体に対して、常に、正確なパターン検査を行なうことができるパターン検査方法及びその装置、ならびにマスク製造方法を提供すること。 - 特許庁

To provide a proximity scanning apparatus for highly accurately performing positioning processing between a substrate and a mask at a high speed even when areas without having substrate patterns formed exist on a part of the substrates, and to provide its illuminance control method.例文帳に追加

基板の一部に下地パターンが形成されていない領域があっても、基板とマスクとの位置合わせ処理を高速且つ高精度に行なうことができる近接スキャン露光装置及びその露光方法を提供する。 - 特許庁

To provide a multilayer print circuit board capable of performing inter-layer connection without manufacturing a mask by eliminating a wet process, and capable of manufacturing a multilayer print circuit board with high reliability.例文帳に追加

湿式工程をなくしてマスクの製造なしで層間接続ができ、信頼性の高い多層印刷回路基板を製造することのできる多層印刷回路基板の製造方法を提供する。 - 特許庁

To provide an optical element which is obtained by using a glass substrate as a material and without performing processes for forming and removing a mask film and which has an arbitrary refractive index distribution; and to provide a method for manufacturing the same.例文帳に追加

ガラス基板を材料として、マスク膜の形成・除去工程を無くし、かつ任意の屈折率分布を持った、光学素子及びその製造方法を提供すること。 - 特許庁

To provide a pattern working method and a pattern working device, working the worked base within a mask width to be flat without over-etching by anisotropy working, and performing microprocessing.例文帳に追加

異方性の加工によりオーバエッチングを生じることなくマスク幅内の加工底面を平坦に加工でき、微細加工が可能なパターン加工方法及びパターン加工装置を提供する。 - 特許庁

To provide a processing method and cleaning equipment performing selective removal at a region on a work without using any mask in which cleaning work is not required after processing and environmental influence is suppressed.例文帳に追加

環境影響が少なく、加工後洗浄が不要な、被加工物上のある領域にマスクを用いず選択的に除去加工する加工方法ならびに洗浄装置を提供する。 - 特許庁