「がら研磨」に関連した英語例文の一覧と使い方 - Weblio英語例文検索

ガラス研磨用研磨材およびそれを用いた研磨方法例文帳に追加

POLISHING MATERIAL FOR POLISHING GLASS AND POLISHING USING THE SAME - 特許庁

ガラス研磨用研磨材およびその研磨方法例文帳に追加

GLASS-POLISHING ABRASIVE AND POLISHING USING THE SAME - 特許庁

ガラスディスク研磨装置例文帳に追加

GLASS DISK GRINDING APPARATUS - 特許庁

ガラス加工用研磨機例文帳に追加

POLISHING MACHINE FOR GLASS WORK - 特許庁

ガラス材の研磨方法例文帳に追加

METHOD FOR GRINDING GLASS MATERIAL - 特許庁

板ガラスの研磨装置例文帳に追加

POLISHING DEVICE OF PLATE GLASS - 特許庁

ガラス板の研磨装置例文帳に追加

POLISHING DEVICE FOR GLASS PLATE - 特許庁

ガラス板の研磨方法例文帳に追加

METHOD FOR POLISHING GLASS PLATE - 特許庁

ガラス基板研磨方法例文帳に追加

GLASS SUBSTRATE POLISHING METHOD - 特許庁

ガラス物品用研磨具例文帳に追加

GRINDING TOOL FOR GLASS ARTICLE - 特許庁

板ガラスの研磨装置例文帳に追加

PLATE GLASS GRINDING APPARATUS - 特許庁

ガラス用研磨パッド例文帳に追加

POLISHING PAD FOR GLASS - 特許庁

ガラス基板研磨方法例文帳に追加

METHOD OF POLISHING GLASS SUBSTRATE - 特許庁

ガラス基板の研磨方法例文帳に追加

GLASS SUBSTRATE POLISHING METHOD - 特許庁

板ガラスの研磨装置例文帳に追加

PLATE GLASS POLISHING DEVICE - 特許庁

研磨用定盤及び該研磨用定盤を用いた板ガラスの研磨方法例文帳に追加

SURFACE PLATE FOR POLISHING AND POLISHING METHOD OF PLATE GLASS USING SURFACE PLATE FOR POLISHING - 特許庁

ガラス研磨用研磨材組成物およびそれを用いた研磨方法例文帳に追加

ABRASIVE MATERIAL COMPOSITION FOR GLASS POLISHING AND POLISHING METHOD USING THE SAME - 特許庁

研磨用織物及び研磨用織物を用いたガラスディスク研磨方法例文帳に追加

POLISHING CLOTH AND METHOD FOR POLISHING GLASS DISK USING THE SAME - 特許庁

研磨材粒子の品質評価方法、研磨方法及びガラス研磨用研磨材例文帳に追加

QUALITY-EVALUATING METHOD OF ABRASIVE MATERIAL PARTICLE, POLISHING METHOD, AND ABRASIVE MATERIAL FOR POLISHING GLASS - 特許庁

研磨定盤の研磨布に前記の金属用研磨液を供給しながら、被研磨膜を有する基板を研磨布に押圧した状態で研磨定盤と基板を相対的に動かすことによって被研磨膜を研磨する研磨方法。例文帳に追加

The method for polishing a film to be polished, comprises supplying the polishing liquid for the metal to the polishing cloth of a polishing board and simultaneously relatively moving the polishing board and a substrate in a state that the substrate having a film to be polished is pressed to the polishing cloth. - 特許庁

研磨定盤の研磨布上に前記の金属用研磨液を供給しながら、被研磨膜を有する基板を研磨布に押圧した状態で研磨定盤と基板を相対的に動かすことによって被研磨膜を研磨する研磨方法。例文帳に追加

This method enables the polishing of a film to be polished by moving a polishing plate and a substrate having the film to be polished relatively in the state of pressurizing the substrate to a polishing cloth of the polishing plate while feeding the metal-polishing solution onto the polishing cloth. - 特許庁

ガラス研磨ブラシ用毛材およびガラス研磨ブラシ例文帳に追加

BRISTLE MATERIAL FOR GLASS POLISHING BRUSH AND GLASS POLISHING BRUSH - 特許庁

ガラス基板研磨用キャリア及びガラス基板研磨装置例文帳に追加

CARRIER FOR POLISHING GLASS SUBSTRATE, AND GLASS SUBSTRATE POLISHING DEVICE - 特許庁

ガラス研磨方法及びガラス研磨装置例文帳に追加

METHOD AND DEVICE FOR POLISHING GLASS - 特許庁

ガラスディスク研磨装置およびガラスディスク研磨方法例文帳に追加

GLASS DISK POLISHING DEVICE AND METHOD - 特許庁

石英ガラス基板の研磨剤及び研磨方法例文帳に追加

ABRASIVE AND METHOD FOR POLISHING QUARTZ GLASS SUBSTRATE - 特許庁

ガラス板の連続研磨装置及び連続研磨方法例文帳に追加

CONTINUOUS GRINDING DEVICE AND METHOD OF GLASS PLATE - 特許庁

研磨材およびそれを用いた板ガラスの研磨方法例文帳に追加

POLISHING MATERIAL, AND METHOD FOR POLISHING PLATE GLASS USING THE SAME - 特許庁

板硝子の研磨方法および研磨装置例文帳に追加

POLISHING METHOD AND POLISHING DEVICE OF SHEET GLASS - 特許庁

ガラス板の研磨方法及び研磨装置。例文帳に追加

POLISHING METHOD AND DEVICE FOR GLASS PLATE - 特許庁

研磨パッドおよびガラス基板研磨方法例文帳に追加

POLISHING PAD AND GLASS SUBSTRATE POLISHING METHOD - 特許庁

ガラス物品の研磨方法および研磨装置例文帳に追加

METHOD FOR POLISHING GLASS ARTICLE AND POLISHING DEVICE - 特許庁

ガラス基板の研磨方法及び研磨装置例文帳に追加

METHOD AND DEVICE FOR POLISHING GLASS SUBSTRATE - 特許庁

これらの研磨線５を、被研磨物、例えばウェーハ６の被研磨面上または研磨線５上に研磨砥粒２ａを供給しながら、この被研磨面上を走査させることにより被研磨物の研磨を行う。例文帳に追加

As polishing compound particles 2a is fed onto a polished object such as a polished surface of a wafer 6 or polishing wires 5, the polished object is polished by scanning polishing wires 5 on the polished surface. - 特許庁

研磨方法は通常の酸化セリウム等の研磨材によりガラスを研磨し、次いでそのガラスを上記の研磨材により研磨する方法である。例文帳に追加

The polishing method comprises polishing a glass with an ordinary abrasive, such as cerium oxide, and then with this abrasive. - 特許庁

ウエハ研磨装置１００では、研磨パッド１４に研磨剤を供給しながらウエハＷを研磨パッド１４に押し当てて研磨する。例文帳に追加

In the wafer polishing device 100, a wafer W is pressed against a polishing pad 14 and polished while an abrasive agent is supplied onto the polishing pad 14. - 特許庁

ガラス基板の研磨において、研磨作業終了後の、使用済研磨液中の酸化セリウム研磨材を研磨作業に再使用する。例文帳に追加

To reuse a cerium oxide abrasive material, which is present in a used abrasive liquid after abrading work is completed, in an abrading work in the abrasion of a glass substrate. - 特許庁

研磨する膜を形成した基板を研磨定盤の研磨布に押しあて加圧し、ＣＭＰ研磨剤を研磨膜と研磨布との間に供給しながら、基板と研磨定盤を相対的に動かして研磨する膜を研磨する基板の研磨方法。例文帳に追加

The method for polishing a substrate comprises pressing the substrate having formed a film to be polished against a polishing cloth of a polishing fixed plate, pressurizing the polishing cloth and relatively moving the substrate from the polishing fixed plate and polishing the film to be polished while supplying the CMP abrasive between the film to be polished and the polishing cloth. - 特許庁

研磨する膜を形成した基板を研磨定盤の研磨布に押しあて加圧し、ＣＭＰ研磨剤を研磨膜と研磨布との間に供給しながら、基板と研磨定盤を動かして研磨する膜を研磨する基板の研磨方法。例文帳に追加

A method of abrading a substrate comprises pressing a substrate on which a film to be abraded has been formed to the abrasive cloth of an abrasion surface plate, pressurizing the substrate, and operating the substrate and the abrasion surface plate while supplying the CMP abrasive material between the film to be abraded and the abrasive cloth to effect the abrasion of the film. - 特許庁

ガラス基板研磨ヘッド及びこれを用いた研磨装置、ガラス基板研磨方法、ガラス基板例文帳に追加

GLASS SUBSTRATE POLISHING HEAD, POLISHING DEVICE USING THIS POLISHING HEAD, GLASS SUBSTRATE POLISHING METHOD AND GLASS SUBSTRATE - 特許庁

十分な研磨性を有しながら、被研磨物の平滑性に優れた研磨用基布を提供すること。例文帳に追加

To provide a base cloth for polishing, achieving excellent smoothness of a material to be polished while having enough polishing performance. - 特許庁

タイヤ表面を研磨する研磨装置において、研磨位置及び研磨量を目視しながら研磨することができるものであって、複雑なタイヤ表面形状であっても適切な研磨が行えるタイヤ表面研磨装置を提供すること。例文帳に追加

To provide a surface polishing apparatus for polishing a tire surface while visually checking the polishing position and the polishing amount, and performing the adequate polishing even when the tire surface shape is complicated. - 特許庁

また、同研磨処理は、ｐＨ４以下とした研磨剤でガラス基板を研磨する前研磨工程と、ｐＨ８．５以上とした研磨剤でガラス基板を研磨する後研磨工程との２工程に分けて行われる。例文帳に追加

Also, the polishing treatment is performed in two steps; a prepolishing step of polishing the glass substrate by the polishing agent regulated to a pH below 4 and a post polishing step of polishing the glass substrate by the polishing agent regulated to a pH above 8.5. - 特許庁

被研磨物７８および研磨パッド２０間に研磨液を供給し、保持定盤７１、研磨定盤７２で被研磨物７８に圧力をかけながら被研磨物７８を研磨加工する。例文帳に追加

A polishing liquid is supplied between the object 78 to be polished and the polishing pad 20, and the object 78 to be polished is polished while applying pressure onto the object 78 to be polished by the holding surface plate 71 and the polishing surface plate 72. - 特許庁

基板研磨装置の研磨テーブルの研磨面の温度を測定し、該測定した温度情報をＰＩＤ制御によりフィードバックして研磨面を温調しながら基板を研磨する基板研磨装置、基板研磨方法、基板研磨装置の研磨パッド面温調装置を提供する。例文帳に追加

To provide a substrate polishing apparatus and a substrate polishing method measuring a temperature of a polishing surface of a polishing table of the substrate polishing device and polishing the substrate while adjusting the temperature of the polishing surface by feeding-back the measured temperature information by PID control, and an apparatus for regulating the temperature of a surface of a polishing pad for the substrate polishing apparatus. - 特許庁