亀裂密度の英語

また、接合面６をボス部設置領域の端面９と同一平面にしてボス部４の付け根に亀裂を生じさせる原因となる第１成形体１の各部の密度差を小さく抑えられるようにした。例文帳に追加

The joining surface 6 is made flush with the end face 9 of a boss part installation area to suppress a density difference in each part of the first molding 1 causing crack in the root of the boss part 4. - 特許庁

保護膜３２における金属酸化物の粒子の嵩密度は、８０％以上であり、被着面の管軸方向における亀裂の数は、２０[／ｍｍ]以上２００[／ｍｍ]以下である。例文帳に追加

The bulk density of the particles of metal oxide in the protective membrane 32 is 80% or more, and the number of cracks in the tube axial direction of the coated surface is 20 [/mm] or more and 200 [/mm] or less. - 特許庁

二次電池の製造時及び充放電時におけるポリマー電解質層への亀裂の発生を阻止するとともに、二次電池のエネルギ密度を向上する。例文帳に追加

To obstruct the generation of cracks in a polymer electrolyte layer in manufacturing and in charge/discharge of a secondary battery and enhance energy density of the secondary battery. - 特許庁

このような結晶面を主面とするシリコン単結晶は、＜１００＞方位のシリコン単結晶よりも、有効ボンド密度やヤング率が４０〜５０％程度高いため、劈開が起こり難く亀裂が発生しづらい。例文帳に追加

The silicon single crystal having such a crystal plane as its principal plane has effective bond density and Young's modulus thereof which are about 40% to about 50% higher than those of a silicone single crystal with <100> orientation, and therefore cleavages and cracks are hardly caused. - 特許庁

また、保持部材４（具体的には第２分割片４１）と充填部材５との接触面に接合剤５０がはみ出さないので、充填部材５の充填密度が不均一とならず、検出素子２や保持部材４に亀裂が生じることを抑制できる。例文帳に追加

Also fill density of a filling member 5 is always evenly-maintained to avoid cracking on the detecting device 2 or the support member 4 because the agglutinant 50 will not overflow on the contact surface between the support member 4 (in concrete terms, the second split piece 41) and the filling member 5. - 特許庁

泥漿鋳込み成形における着肉性に優れ、成形体の乾燥収縮による亀裂発生が無く、焼結時の収縮率のバラツキがきわめて少なく、高密度で高強度を有する炭化珪素質焼結体およびその製造方法を提供する。例文帳に追加

To obtain a silicon carbide sintered compact having excellent casting properties in a slip casting, not causing occurrence of crack in the drying shrinkage of a molding, extremely slight dispersion of shrinkage percentage in sintering, having a high density and a high strength and to provide a method for producing the same. - 特許庁

多孔性基板に活物質を充填する工程の途中で活物質に亀裂を生じさせることにより、基板とコバルト化合物との集電距離を接近させて集電距離を向上させ、高密度に活物質を充填しても活物質利用率が向上したニッケル正極を提供する。例文帳に追加

To provide a nickel positive electrode, having improved collection distance by causing crackings in an active material during filling the active material in a porous substrate, to make the collection distance shorter between the substrate and a cobalt compound and having an improved active material utilization factor, even if the active material is filled therein with high density. - 特許庁

泥漿鋳込み成形における着肉性に優れ、成形体の乾燥収縮による亀裂発生が無く、焼結時の収縮率のバラツキがきわめて少なく、高密度で高強度を有する炭化珪素質焼結体およびその製造方法を提供する。例文帳に追加

To provide a silicon carbide sintered compact having high density and high strength and a method of producing the same, which is capable of forming with good casting property by slip casting and drying a formed body without causing cracks caused by the shrinkage at drying and in which the dispersion of the coefficient of contraction is quite small when the formed body is sintered. - 特許庁