侵入過程の英語

閉口の過程で障害物１１の検知により、袖扉４及び侵入阻止側壁扉１０を移動自在とするか、付勢手段を設けて開放させ、同時に回転扉体３の回転を停止させる。例文帳に追加

The wing door 4 and the intrusion-preventive sidewall door are moved freely or an urging means is mounted and the door is opened by detecting the obstruction 11 in the process of the closing of the opening, and the rotation of the revolving door body 3 is stopped simultaneously. - 特許庁

閉口の過程で障害物１１の検知により、袖扉４及び侵入阻止側壁扉１０を移動自在とするか、付勢手段を設けて開放させ、同時に回転扉体３の回転を停止させる。例文帳に追加

The wing door 4 and the intrusion-preventive side wall door 10 are moved freely or an urging means is mounted for opening the doors while the rotation of the revolving door body 3 is stopped simultaneously by detecting the obstruction 11 in the process of the closing. - 特許庁

液晶表示素子の内部に配向膜３０を通じて水が侵入すると、その配向膜３０中に含まれている水分捕獲元素が水を捕獲するため、液晶表示素子の長期間に渡る動作過程において垂直配向液晶４０まで水が到達しにくくなる。例文帳に追加

Even when water invades the inside of a liquid crystal display element via the alignment layer 30, as the moisture capturing element contained in the alignment layer 30 captures the water, the water scarcely reaches the vertical alignment liquid crystal 40 during an operating process of the liquid crystal display element over an extended period of time. - 特許庁

そして、きのこ栽培の芽出し過程において、きのこ栽培用カバーにより、容器の上端開口部１２を覆って、容器１０の内外に空気を循環させつつ、水滴などの湿気が容器１０内に直接に多量に侵入したり、容器１０内の培地６０が乾燥し過ぎたりするのを防ぐ。例文帳に追加

In the germinating process for cultivating the mushrooms, the top opening 12 of the container 10 is covered with the cover for cultivating the mushrooms to prevent a large amount of moisture such as waterdrops from directly entering the interior of the container 10 or the culture medium 60 in the container 10 from excessively drying while circulating the air through the interior or exterior of the container 10. - 特許庁

梱包高さを低く抑え得るだけでなくごみやほこりの常時侵入をなくすことができ、さらに商品が物流過程で受けた衝撃の程度を測ることもできるキャスタ付商品の包装、梱包に用いるパレット構造を提供する。例文帳に追加

To provide a pallet structure for packaging or packing a product with caster which can not only reduce the packing height but prevent trash and dust from continually coming in and measure an impact degree given to the product during a distribution process. - 特許庁

プラズマ浸炭処理を施した純チタンを、プラズマ浸炭処理後に１５Ｐａ以下の真空下で、２００℃以上前記プラズマ浸炭処理の下限温度の範囲に３０分から１０時間の範囲の所要時間保持するベーキング処理を実施して、前記浸炭処理過程でチタン金属内に侵入した水素を除去するようにしたのである。例文帳に追加

The baking method for pure titanium carburized with plasma is characterized by baking the titanium in a vacuum atmosphere of 15 Pa or less, at 200°C or higher but at a lower limit temperature of plasma carburization treatment or lower, for duration of 30 minutes to ten hours, after plasma carburization treatment, to remove the hydrogen which has invaded in the titanium metal during the carburization treatment. - 特許庁

溶体化及び時効処理後にプラズマ浸炭処理を施したチタン合金を、プラズマ浸炭処理後に１５Ｐａ以下の真空下で、２００℃以上時効処理の下限温度の範囲に３０分から１０時間の範囲の所要時間保持するベーキング処理を実施して、前記浸炭処理過程でチタン合金内に侵入した水素を除去するようにしたのである。例文帳に追加

Hydrogen having entered into the titanium alloy in the carburizing treatment process can be removed by subjecting the titanium alloy which has been subjected to the plasma carburizing treatment after solution heat treating and age hardening to the baking treatment comprising keeping the titanium alloy at a temperature of not lower than 200°C to the lower temperature in the carburizing treatment for 30 min to 10 h. - 特許庁