ふじちょうにじょう４ちょうめの英語

本ロボット１のハンド２においては、ガラス基板３に向けて空気を供給しガラス基板３を浮上させるフォーク２２に配置された空気穴６と、ガラス基板３の位置決めを行う左右のフォーク２３に配置された爪１９と、ガラス基板３をハンド２上に固定する為の左右のフォーク２３に配置された滑り止め部５及び／又は吸着パッド４と、を有することを特徴とする。例文帳に追加

The hand 2 of a robot 1 has air holes 6 disposed in forks 22 for supplying air toward the glass substrate 3 to lift the glass substrate 3; claws 19 arranged at right and left forks 23 for positioning the glass substrate 3; non-slip parts 5 and/or suction pads 4 arranged at the right and left forks 23 to fix the glass substrate 3 on the hand 2. - 特許庁

2000年２月にパネル報告が、同年５月には上級委員会報告が出され、いずれも日本の主張をほぼ認め、本件関税免除措置がGATT 第１条１項（最恵国待遇）、第３条４項（内国民待遇）、補助金協定、及びサービス協定第17条（サービスの内国民待遇）に違反するとの判断が出された（なお、卸売サービスに関するサービス協定第２条（最恵国待遇）及び第17条（内国民待遇）違反を認定したパネルについては、上級委員会はパネルでの事実認定が不十分であるとして当該判断を覆した。）。例文帳に追加

The panel issued its report in February 2000, and the Appellate Body issued its report in May. Both reports upheld virtually all of Japan’s arguments, finding that the measure: (1) violated GATT Article I:1 (MFN treatment); (2) violated GATT Article III:4 (national treatment); (3) violated the SCM Agreement; and (4) violated Article XVII of the GATS (national treatment). However, the Appellate Body overturned the finding of the panel that the duty waiver violated Article II of the GATS (MFN treatment) and Article XVII (national treatment) of the GATS, stating that the panel based its ruling on a lack of sufficient evidence. - 経済産業省

同年12月11日(旧暦)に下野国国府を占領し、続いて迎撃に出兵した上野国国司藤原尚範（同国は親王任国のため、介が最高責任者。藤原純友の叔父）を捕らえて助命する代わりに印綬を接収して国外に放逐、12月19日(旧暦)には指揮官を失った上野国府を落とし、関東一円を手中に収めて「新皇」を名乗り天皇に即位、独自に除目を行い岩井市（茨城県坂東市）に政庁を置いた。例文帳に追加

On January 27 of the same year, he occupied the local government of Shimonotsuke Province, and then he captured the governor of Kozuke province, FUJIWARA no Hisanori (because this province was a shinno ninkoku [provinces whose gubernatorial posts were reserved as sinecures for imperial princes], the suke had the highest authority), and in exchange for sparing his life, Masakado took possession of the inju and exiled him; on February 4, he toppled the provincial office of Kozuke, which had lost its commander, thereby capturing the entirety of the Kanto region, enthroned himself as Shinno (the New Emperor), and, performing a Jimoku assignment ceremony himself, established the seicho (government office) in Iwai City (Bando City of Ibaraki Prefecture).発音を聞く  - Wikipedia日英京都関連文書対訳コーパス

半導体基板１上に成長された同導電型のエピタキシャル層２上面に設けた多数個のトレンチ３と、前記エピタキシャル層２上面と前記トレンチ３の側面および底面に形成された逆導電型で低不純物濃度のアノード領域４とを備え、該アノード領域４と前記エピタキシャル層２で形成されるＰＮ接合領域の面積を前記トレンチ内壁に沿って深さ方向に増大させて容量値を維持してチップを小型化することを可能にした。例文帳に追加

The area of a PN junction defined by the anode region 4 and the epitaxial layer 2 is increased in the depth direction along the inner wall of the trench in order to sustain the capacitance thus reducing the chip size. - 特許庁

本発明に係る半導体装置は、半導体基板１上にゲート絶縁膜２を形成する工程と、前記ゲート絶縁膜２上にアモルファスシリコン膜３を形成する工程と、前記アモルファスシリコン膜３に不純物イオン４をイオン注入する工程と、前記アモルファスシリコン膜３を加工することにより、前記ゲート絶縁膜２上にゲート電極３ａを形成する工程と、を具備することを特徴とする半導体装置の製造方法。例文帳に追加

The manufacturing method of the semiconductor device includes a step of forming a gate insulating film 2 on a semiconductor substrate 1, a step of forming an amorphous silicon film 3 on the gate insulating film 2, a step of implanting impurity ions 4 into the amorphous silicon film 3, and a step of forming a gate electrode 3a on the gate insulating film 2 by processing the amorphous silicon film 3. - 特許庁

法然房源空(1)→勢観房源智(前2)→法蓮房信空(後2)→正信房湛空(3)→求道房恵尋(4)→素月房恵顗(5)→寿観房任空(6)→示観房範空(7)→我観房運空(8)→僧然定玄(9)→佛立恵照国師（僧任等凞）(10)→良秀僧尋(11)→聖深阿縁(12)→僧海等珍(13)→僧秀良玉(14)→威照良真(15)→称譽秀馨(16)→極譽理聖(17)→栄譽永真(18)→西譽雲栖(19)→弘譽伝心(20)→性譽法山(21)→道残源立(22)→看譽源良(23)→縁譽休岸(24)→長譽源然(25)→琴譽盛林(26)→了的(27)→潮呑(28)→忍譽源授(29)→眼譽呑屋(30)→誓譽厳真(31)→檀譽順応(32)→広譽順長(33)→叶譽酋村(34)→通譽◎林(35)→薫譽寂仙(36)→重譽写悦(37)→到譽順教(38)→香譽春沢(39)→鑑譽万竜(40)→法譽智俊(41)→晃譽念潮(42)→到譽潮音(43)→謙譽霊忠(44)→神譽感霊(45)→覚譽霊長(46)→逾譽俊海(47)→禀譽(48)→浄譽原澄(49)→明譽顕海(50)→祐譽天従(51)→宣譽巨道(52)→貫譽学善(53)→住譽密善(54)→在譽祐倫(55)→黒谷定円〘寥譽〙(56)→獅子吼観定〘梁譽〙(57)→佐藤説門〘開譽〙(58)→獅子吼観定〘梁譽〙(59)→秋浦定玄〘静譽〙(60)→吉水賢融〘仏譽〙(61)→大鹿愍成〘深譽〙(62)→郁芳随円〘相譽〙(63)→望月信亨〘昱譽〙(64)→芳井教岸〘道譽〙(65)→川端信之〘源譽〙(66)→渡辺教善〘闡譽〙(67)→千葉良導〘妙譽〙(68)→福井周道〘鑑譽〙(69)→澤崎梁寿〘定譽〙(70)→藤原弘道〘法譽〙(71)→稲岡覚順〘等譽〙(72)→坪井俊映〘仁譽〙(73)→高橋弘次〘満譽〙(74)例文帳に追加

Honenbo Genku (1)->Seikanbo Genchi (first period of 2)->Horenbo Shinku (latter period of 2)->Shoshinbo Tanku (3)->Gudobo Keito (4)->Sogetsubo Eke (5)->Suganbo Jinku (6)->Jikanbo Hanku (7)->Gaganbo Unku (8)->Sozen Jogen (9)->Butsuryu Eisho Kokushi (Sonin Nadohiro) (10)->Yoshihide Sojin (11)->Seimi Aen (12)->Sokai Rachin(13)->Soshu Ryogyoku (14)->Iteri Ryoshin (15)->Shoyo Shukei (16)->Gokuyo Risei (17)->Eiyo Eishin (18)->Saiyo Unsei (19)->Koyo Denshin (20)->Seiyo Hozan (21)->Dozan Genryu (22)->Kanyo Genryo (23)->Enyo Kyugan (24)->Choyo Genzen (25)->Kinyo Seirin (26)->Ryoteki (27)->Chodon (28)->Ninyo Genju (29)->Ganyo Donya (30)->Seiyo Ganshin (31)->Danyo Juno (32)->Koyo Juncho (33)->Kyoyo Shuson (34)->Tsuyo Chorin (35)->Kunyo Jakusen (36)->Juyo Shaetsu (37)->Toyo Junkyo (38)->Koyo Shuntaku (39)->Kanyo Manryu (40)->Hoyo Chishun (41)->Koyo Nencho (42)->Toyo Choon (43)->Kenyo Reishi (44)->Shinyo Kanrei (45)->Kakuyo Reicho (46)->Yuyo Shunkai (47)->Rinyo (48)->Joyo Gencho (49)->Meiyo Kenkai (50)->Yuyo Tenju (51)->Senyo Kyodo (52)->Kanyo Gakuzen (53)->Juyo Myozen (54)->Zaiyo Yurin (55)->Kurotani Joen [Ryoyo] (56)->Shishiku Kanjo [Ryoyo] (57)->Sato Zeimon [Kaiyo] (58)->Shishiku Kanjo [Ryoyo] (59)->Shuho Jogen [Seiyo] (60)->Kissui Kenyu [Butsuyo] (61)->Oka Binjo [Shinyo] (62)->Ikuho Zuien [Soyo] (63)->Mochizuki Shinko [Ikuyo] (64)->Hoi Kyogan [Doyo] (65)->Kawabata Nobuyuki [Genho] (66)->Watanabe Kyozen [Senyo] (67)->Chiba Ryodo [Myoyo] (68)->Fukui Shudo [Kanyo] (69)->Sawazaki Ryoju [Joyo] (70)->Fujiwara Hiromichi [Hoyo] (71)->Inaoka Kakujun [Toyo] (72)->Tsuboi Shunei [Jinyo] (73)->Takahashi Koji [Manyo] (74)発音を聞く  - Wikipedia日英京都関連文書対訳コーパス