「diffraction」に関連した英語例文の一覧と使い方(60ページ目) - Weblio英語例文検索

In this case, since the diffraction face 10b of the diffraction grating 10 is irradiated at the same angle with bisected linearly polarized light, diffraction efficiencies to two polarized light become mutually equal, and, even if the polarized state of light to be measured is changed, the sum of powers of two polarized light is always kept at a fixed value, to thereby remove the polarized light dependency.例文帳に追加

その際、２つに分離された直線偏光光が同じ角度で回折格子１０の回折面１０ｂに照射されるので、２つの偏光に対する回折効率は互いに等しくなり、被測定光の偏波状態が変化しても、２つの偏光のパワーの和は常に一定値に維持され、偏光依存性が解消される。 - 特許庁

In this optical disk device, a plurality of diffraction regions are prepared in a diffractive optical element, with a different diffractive characteristic provided for each of these diffraction regions, and with a diffraction element structured for converging light beams on nearly the same region, and then the incidence angle of the light beam to an optical disk is changed on the basis of the output of a photodetecting means.例文帳に追加

本発明の光ディスク装置では、回折光学素子に、複数の回折領域を設け、前記回折領域の各々に、異なる回折特性を持たせ、光ビームを略同一領域に集光する回折素子を構成し、光検出手段の出力に基づいて、光ディスクへの光ビームの入射角を変化させる。 - 特許庁

The optical disk apparatus includes: a light source for emitting light; an objective lens for converging the light onto a signal surface of an optical disk; a polarized beam diffraction element for diffracting the light reflected from the optical disk; a photodetector for detecting the light diffracted from the polarized beam diffraction element; and a wavelength plate disposed between the optical disk and the polarized beam diffraction element.例文帳に追加

本発明の光ディスク装置は、光を放射する光源、光を光ディスクの信号面に収束させる対物レンズ、光ディスクで反射された光を回折する偏光性光分岐器、偏光性光分岐器によって回折された光を検出する光検出器、及び光ディスクと偏光性光分岐器との間に配置された波長板を備える。 - 特許庁

An optical pickup includes a light receiving element PD including a first light receiving unit P1 for detecting light quantity of a portion of a return laser beam including a push-pull component of a diffraction laser beam GL1 diffracted by a diffraction grating 8, and a second light receiving unit for detecting light quantity of a portion including a light-receiving quantity off-set component of the diffraction laser beam.例文帳に追加

受光素子ＰＤが、戻りレーザ光のうち回折格子８で回折された回折レーザ光ＧＬ１のプッシュプル成分を含む部分の光量を検出する第１受光部Ｐ１と、前記回折レーザ光の受光光量オフセット成分を含む部分の光量を検出する第２受光部とを備えている光ピックアップ。 - 特許庁

A shield part 11 shields reflection light which satisfies a formula: where θ represents an angle of light emitted from the objective lens 3 and condensed toward a surface to be measured 101 with respect to an optical axis, λ represents a wavelength of the light source 2, d represents pitch of a diffraction grating formed in the surface to be measured 101, and n represents the order of diffraction light by the diffraction grating.例文帳に追加

そして、対物レンズ３から出射され、被測定面に向けて集光される光の光軸に対する角度をθ、光源２の波長をλ、被測定面１０１に形成された回折格子のピッチをｄ、回折格子による回折光の次数をｎとした場合に、遮蔽部１１は、を満たす反射光を遮蔽する。 - 特許庁

The adjustment mechanism for the plane diffraction grating 1 which is fixed to the holder 2 and has plane diffraction grating groves 1a formed in parallel with the revolving shaft 5 of the holder is provided with a plate 3 to one side of which the plane diffraction grating is stuck and the other side is detachably fixed to the holder by a plurality of screws 4.例文帳に追加

ホルダ２に固定され、該ホルダの回転軸５と平行に形成された平面回折格子溝1aを有する平面回折格子１の調整機構において、前記平面回折格子が一方の面に固着されたプレート３を備え、該プレートの他方の面が前記ホルダに複数のネジ４で取り外し可能に固定されている平面回折格子の調整機構。 - 特許庁

To provide an airtight sample holder for x-ray diffraction measurement which is a holder to be used for holding a measurement target sample in a measurement instrument in an airtight state in x-ray diffraction measurement and is capable of easily setting a sample and preventing occurrence of such a problem that diffraction from a portion such as an x-ray transmission window other than the sample may be detected.例文帳に追加

Ｘ線回折測定において測定対象試料を気密状態で測定装置内に保持するために使用されるホルダーであって、試料のセットが容易で、かつＸ線透過窓等の試料以外の部分からの回折を検出する問題も生じさせないＸ線回折測定用気密試料ホルダーを提供する。 - 特許庁

This shape evaluation method of the diffraction grating having the phase shift part includes an interference fringe detection process for detecting an interference fringe, corresponding to the irregularities of the diffraction grating, and a shape evaluation process for evaluating the shape of the diffraction grating, based on the interference fringe detected in the interference fringe detection process.例文帳に追加

本発明に係る回折格子の形状評価方法は、位相シフト部を有する回折格子の形状評価方法であって、回折格子の凹凸に対応する干渉縞を検出する干渉縞検出工程と、干渉縞検出工程で検出した干渉縞に基づいて、回折格子の形状評価をおこなう形状評価工程とを含む。 - 特許庁

This glass substrate for a display, comprising a glass substrate on whose surface a metal ion diffusion-preventing film 2 is formed, characterized in that the metal ion diffusion-preventing film 2 is a crystalline SnO2 film having a half-value width of ≤1 at one or more diffraction peaks at diffraction angles of about 26.5°, about 37.9° and about 51.6° by X-ray diffraction.例文帳に追加

表面に金属イオン拡散防止膜２が形成されたガラス基板よりなるディスプレイ用ガラス基板において、該金属イオン拡散防止膜２がＸ線回折による回折角約２６．５°、約３７．９°及び約５１．６°のいずれか１以上の回折ピークにおける半値幅が１°以下の結晶性ＳｎＯ_２膜であるディスプレイ用ガラス基板。 - 特許庁

The electrostatic charge image developing toner contains at least a binder resin, a colorant, a release agent and a modified resin, wherein the release agent has a diffraction peak 2θ in the range of 15 to 20° in X-ray diffraction using Cu Kα-ray, and the toner including the release agent has also the diffraction peak in the same range.例文帳に追加

少なくとも結着樹脂、着色剤、離型剤、変性体樹脂を含有する静電荷像現像用トナーにおいて、ＣｕのＫα線を用いたＸ線回折において２θが１５〜２５°の範囲に回折ピークを持つ離型剤が、該離型剤を含有したトナーにおいても同じ範囲に回折ピークが現れることを特徴とする。 - 特許庁

In the spectral image apparatus measuring an image wherein only a specified wavelength region is extracted from an incident image, a first diffraction grating for analyzing the incident image into spectrum, a second diffraction grating for recombining the analyzed images, and a means which is arranged between the first and the second diffraction gratings and limits a wavelength band, are installed.例文帳に追加

入射画像のうち特定の波長領域のみを抽出した画像を計測する分光画像装置において、入射画像をスペクトルに分解する第１の回折格子と、分解された画像を再合成する第２の回折格子と、前記第１と第２の回折格子の中間にあって波長帯域を制限する手段を備える。 - 特許庁

The diffraction grating 13 has a diffraction region 21 formed only on the light emission surface side where a main beam 27 and ±1st order sub-beams 29a, 29b or a main beam 27' and ±1st order sub-beams 29a', 29b' are generated by performing diffraction separation of a first laser beam 25 or second laser beam 25' emitted from a two-wavelength semiconductor laser.例文帳に追加

回折格子１３は、２波長半導体レーザから射出した第１のレーザ光２５又は第２のレーザ光２５’を回折分離して主ビーム２７及び±１次の副ビーム２９ａ、２９ｂ又は主ビーム２７’及び±１次の副ビーム２９ａ’、２９ｂ’を生成する、光射出面側のみに形成された回折領域２１を有している。 - 特許庁

The diffraction conditions of X-rays are related to not only a component r_ijy in the y-direction of a bond vector r_ij, connecting an atom A_i and an atom A_j, but also to a component r_ijx in the x-direction in a test piece which causes diffraction.例文帳に追加

Ｘ線の回折条件は、回折を起こす、試験片内の、Ａ_ｉ原子及びＡ_ｊ原子を結ぶボンドベクトルｒ_ｉｊのｙ方向成分ｒ_ｉｊｙのみならず、ｘ方向の成分ｒ_ｉｊｘとも関係する。 - 特許庁

If the direction normal to the surface of the stage for holding the object is defined as Z-axis, and the angle formed by a normal to the surface of the diffraction optical element and the Z-axis is defined as α, the diffraction optical element is so arranged as to satisfy the equation 0°<α<45°.例文帳に追加

そして、物体を保持するステージの面の法線方向をＺ軸とし、回折光学素子の面の法線とＺ軸とのなす角をαとする時、回折光学素子は下記の式を満足するように配置させた。 - 特許庁

That is, the crystal orientation property of the copper plated film 102 is controlled so that the rate of X-ray pattern diffraction strength I(111) of the (111) face of the copper plated film 102 to X-ray pattern diffraction strength I(220) of the (220) face of the copper plated film 102 can be set as I(220)/I(111)<0.2.例文帳に追加

詳しくは、銅めっき膜１０２の（１１１）および（２２０）面のそれぞれのＸ線パターン回折強度Ｉ（１１１），Ｉ（２２０）の比が、Ｉ（２２０）／Ｉ（１１１）＜０．２となるように銅めっき膜１０２の結晶配向性を制御する。 - 特許庁

A first luminous flux 7, emitted from the front end face of a semiconductor laser 1, is brought to enter a diffraction grating 3a, and a second luminous flux 8, emitted from the rear end face of the semiconductor laser 1, is brought to enter a diffraction grating 3b.例文帳に追加

半導体レーザ１の前端面から出射された第１の光束７が回折格子３ａに入射すると共に、半導体レーザ１の後端面から出射された第２の光束８が回折格子３ｂに入射する。 - 特許庁

The matter light Lg subjected to Littrow diffraction by a diffraction lattice G and the reference light formed by a reference light forming system 3 for evaluating the minute cycle structure are synthesized by a polarizing beam splitter 7 to form an interference fringe on a screen 6a.例文帳に追加

回折格子Ｇでリトロー回折した物体光Ｌｇと、微小周期構造評価用参照光生成系３で生成された参照光とが偏光ビームスプリッタ２７で合成され、スクリーン６ａ上に干渉縞を形成する。 - 特許庁

At such a time, the shape of a grating to which the point P belongs on the diffraction optical element is set so that the specified diffracted light beam may turn to a predetermined point more separate from the diffraction optical element than the exit pupil on the optical axis.例文帳に追加

このとき、回折光学素子における点Ｐが属する格子の形状は、特定回折光線が光軸上における射出瞳よりも回折光学素子に対して離れた所定点に向かうように設定されている。 - 特許庁

At least one of specified diffraction grating line which is formed by arranging prescribed information as the hidden information into a column of rugged shape is set to have the same L/S ratio as that of the other diffraction grating group and, thereby, a diffractive image without fluctuation or irregularity is obtained.例文帳に追加

隠し情報である所定の情報を一列の凹凸形状としてなる少なくとも一本の特定回折格子線を、他の回折格子線群と同一のＬ／Ｓとすることで、そのバラツキやムラのない回折画像を得る。 - 特許庁

An operation part 16 specifies a diffraction position on the sample from a detection result by the transmitted X-ray detection part 14, and determines a diffraction angle of the diffracted X-ray based on a detection result by the diffracted X-ray detection part 15.例文帳に追加

演算部１６は、透過Ｘ線検出部１４の検出結果から、試料１２における回折位置を特定すると共に、回折Ｘ線検出部１５の検出結果に基づいて、回折Ｘ線の回折角を判定する。 - 特許庁

The formula (1): orientation α=(180-Δβ)/180, provided that Δβ expresses a half width when the X-ray diffraction intensity distribution from 0 to 360° azimuth angle direction is measured by fixing a peak scattering angle in the X-ray diffraction measurement.例文帳に追加

配向度α＝（１８０−Δβ）／１８０…（１）（但し、Δβは、Ｘ線回折測定によるピーク散乱角を固定して方位角方向の０〜３６０度までのＸ線回折強度分布を測定したときの半値幅を表す。） - 特許庁

The lighting unit is provided with a planar body 10 and a diffraction optical element 11 formed on the upper surface of the planar body 10 and converges light which is made incident on the diffraction optical element 11 from various directions and emits the light from an end face of the planar body 10.例文帳に追加

板状体１０と、その上面に形成した回折光学素子１１とを備え、回折光学素子１１に入射する様々な方向からの光を集光して板状体１０の端面から放射する。 - 特許庁

The angle of refraction of the condensed X-ray beam generated by the subject is detected by using the X-ray diffraction of a crystal wherein an incident angle is adjusted so that the edge of the angle distribution of the condensed X-ray beam satisfies a diffraction condition.例文帳に追加

集光Ｘ線ビームの角度分布の端が回折条件を満たすように入射角を調整した結晶のＸ線回折を利用して、被写体によって生じた集光Ｘ線ビームの屈折角を検出する。 - 特許庁

In the expression, β is an angle defined by an incident plane of the incident X-ray and one direction in a surface of the transparent support, and I is diffraction intensity at 2θ=8° in an X-ray diffraction chart measured at the angle β.例文帳に追加

上記式中、βは、入射するＸ線の入射面と前記透明支持体面内のある１方向とのなす角度であり、Ｉは、角度βで測定したＸ線回折チャートにおける２θ＝８°での回折強度である。 - 特許庁

A device and a method are applied for fine adjusting a diffraction grating in an optical wavelength-division multiplexing (WDM) device, and maintaining the diffraction grating at a near-Littrow alignment (or at an accuracy of ±0.003°) over the operational temperature range of the device.例文帳に追加

光学波長分割多重（ＷＤＭ）装置内の回折格子の微調整を可能にし、回折格子を、装置の動作温度にわたって近リトロー・アラインメントに（すなわち＋／−０．００３度の正確さで）維持する装置および方法。 - 特許庁

Void parts 12, each of which has a cyclic structure 13 of causing optical diffraction at the interface, are formed in a substrate 11 and a cyclic structure 15 of causing optical diffraction on a part or all of the surface of the substrate 11 is formed.例文帳に追加

光回折を起こす周期構造１３を界面に有する空隙部１３を基材１１の内部に形成するとともに、基材１１の表面の一部又は全部に光回折を起こす周期構造１５を形成する。 - 特許庁

A diffraction lens structure 25 is formed at an inner end slope 24a of the V-groove 24 facing the front end face of the optical fiber 22 and an optical element (light emitting element) 23 is mounted on a substrate surface 21a right above this diffraction lens structure 25.例文帳に追加

光ファイバ２２の先端面と対向するＶ溝２４の内端傾斜面２４ａに回折レンズ構造２５を形成し、その回折レンズ構造２５の直上において基板表面２１ａに光素子（発光素子）２３を搭載する。 - 特許庁

A portion of a dividing line defining the focusing diffraction region 33 is formed in a shape which is convex toward the inside from the outside with respect to the center 62 of an incident range on the diffraction element 31 which return light enters.例文帳に追加

フォーカス用回折領域３３を規定する分割線の一部は、復路光が入射する回折素子３１上の入射範囲の中心６２に対して、外方から内方に向けて凸を成す形状に形成される。 - 特許庁

The minute relief part mainly emits a primary diffraction light, and a visible light reflectance of the minute relief part is 20% or less, while a visible light reflectance of the diffraction grating part is 50% or more.例文帳に追加

また、前記微細レリーフ部が、一次回折光を主として射出し、前記微細レリーフ部の可視光反射率が２０％以下であり、かつ前記回折格子部の可視光反射率が５０％以上であることを特徴とする。 - 特許庁

The first photodetection section includes a light receiving part which receives zeroth-order diffracted light from the diffraction element 16, and a light receiving part which receives ±first-order diffracted light from the diffraction element 16.例文帳に追加

第１の光検出部は、回折素子１６からの０次回折光を受光する回折素子０次回折光受光部と、回折素子１６からの±１次回折光を受光する回折素子１次回折光受光部とから構成されている。 - 特許庁

Sensors P21-P26 receiving the signal light (primary signal light) by primary diffraction action, and sensors P31-P38 receiving signal light (secondary signal light) by secondary diffraction action are arranged on a detection face of a photodetector.例文帳に追加

光検出器の検出面には、１次回折作用による信号光（１次信号光）を受光するセンサＰ２１〜Ｐ２６と、２次回折作用による信号光（２次信号光）を受光するセンサＰ３１〜Ｐ３８が配されている。 - 特許庁

To provide a microelectronic mechanical system (MEMS) element and a method of manufacturing the MEMS element, to optimize a driving side electrode and a wiring layer in a diffraction type optical MEMS element, and to improve an optical characteristic, particularly the reflection efficiency and diffraction efficiency of a beam.例文帳に追加

光学ＭＥＭＳ素子及びその製造方法、回折型光学ＭＥＭＳ素子における駆動側電極と配線層との最適化を図り、また光学特性、特にビームにおける反射効率、回折効率度の向上を図る。 - 特許庁

In the expression, I{420} represents an X-ray diffraction intensity of a crystal face {420} on the plate surface of the copper alloy plate material, and I_0{420} represents an X-ray diffraction intensity of the crystal face {420} of a standard powder of pure copper.例文帳に追加

Ｉ｛４２０｝／Ｉ_0｛４２０｝＞１.０ ……（１） ここで、Ｉ｛４２０｝は当該銅合金板材の板面における｛４２０｝結晶面のＸ線回折強度、Ｉ_0｛４２０｝は純銅標準粉末の｛４２０｝結晶面のＸ線回折強度である。 - 特許庁

The raw material originated from shell or pearl is mechanochemically ground such that the factor of decrease based on diffraction intensity before grinding at a predetermined Miller index of aragonite crystal obtained by the X-ray diffraction method becomes a prescribed value.例文帳に追加

貝殻または真珠由来の原料をＸ線回折法において得られるアラゴナイト結晶の所定のミラー指数における回折強度の粉砕前を基準とした減少率を所定値とするようにメカノケミカル粉砕する。 - 特許庁

By this constitution, an optical resonance occurs between the projection-side edge face 12a of the semiconductor light emitting device 12 and the diffraction grating 13 of the diffraction grating built-in fiber 14, and a laser beam is projected from the projection-side edge face 12a.例文帳に追加

かかる構成から、半導体発光素子１２の出射側端面１２ａと回折格子内蔵ファイバ１４の回折格子１３との間で光共振が発生し、当該出射側端面１２ａからレーザ光が出射される。 - 特許庁

The light emitted from the LED 6 is totally reflected by the surfaces of the transparent substrates 2, 4 in the regions of a transparent state and is guided but is emitted toward an observer 8 by diffraction in the regions of the diffraction state.例文帳に追加

ＬＥＤ６を出射した光は、ＨＰＤＬＣが透明状態の領域では透明基板２，４の表面で全反射して導光されるが、回折状態の領域では回折により観測者８の方へ出射される。 - 特許庁

Polarized light separating elements (1, 11) each have a diffracting optical element which has a diffraction grating surface and is optically nearly isotropic and a liquid crystal layer which is adjacent to the diffraction grating surface and separates the illumination light into P- and S-polarized lights having mutually orthogonal planes of polarization.例文帳に追加

偏光分離素子(1,11)は、回折格子面を有し光学的に略等方な回折光学素子層と回折格子面に隣接する液晶層とを備え、照明光を偏波面が互いに直交するＰ，Ｓ偏光に分離する。 - 特許庁

By providing the spatial region 41 around the base plate 31, generation of an error variation in the diffraction lines from the base plate 31 caused by the diffraction lines from a specimen plate 29C forming the spatial region 41 is prevented.例文帳に追加

基底板３１の周囲に空間領域４１を設けたことにより、空間領域４１を形成している試料板２９Ｃからの回折線によって基底板３１からの回折線に誤差変動が生じることを防止できる。 - 特許庁

A refraction and diffraction optical system 3 which has positive refracting power for an incident luminous flux and also at least whose one face has a diffraction action is arranged by leaving distance in the optical path reaching the reticle 4 from the turning mirror 2.例文帳に追加

回動ミラー２から焦点板４に到る光路中に、空気間隔を隔てて、入射光束に対する正の屈折力を有し且つ少なくとも１面が回折作用を持つ屈折回折光学系３を配置する。 - 特許庁

In the fibrous phase grating element 1 where a plurality of diffraction gratings 12 are formed in a cylindrical optical fiber, light incident surfaces of diffraction gratings 12 are inclined with respect to the perpendicular direction of the axial center L of the optical fiber.例文帳に追加

円柱状の光ファイバ内に複数の回折格子１２が形成されたファイバ状位相格子素子１において、回折格子１２の光入射面を、光ファイバの軸心Ｌの垂直方向に対して傾斜させた。 - 特許庁

The optical scanner is provided with a light source 1, a predeflector optical system, a polygon mirror 5 and a scanning optical system, wherein the predeflector optical system includes a coupling lens 2 of which the emission face is a phase shifter face and a diffraction lens 4 of which the emission face is a diffraction face.例文帳に追加

光源１、偏向器前光学系、ポリゴンミラー５、及び走査光学系を備え、偏向器前光学系は、射出面が位相シフタ面であるカップリングレンズ２、及び射出面が回折面である回折レンズ４を含んでいる。 - 特許庁

In addition to the rotation adjustment of a diffraction grating 2 around an optical axis, the position of the diffraction grating 2 in the direction of the optical axis is adjusted so as to position a side spot by a side beam on the side spot light receiving element 12 of a photodetector 11.例文帳に追加

回折格子２の光軸周りの回転調整に加えてサイドビームによるサイドスポットがフォトディテクター１１のサイドスポット受光素子１２の中心上に位置するように回折格子２の光軸方向の位置を調整する。 - 特許庁

A carbon material for the electric double-layer capacitor electrode uses oil raw coke as a raw material, such that a graphite-like crystal structure parameter (Ip/Io) at a diffraction peak of a (002) surface of an X-ray diffraction intensity curve is >0.3 and ≤0.8.例文帳に追加

Ｘ線回折強度曲線の（００２）面の回折ピークにおける黒鉛的結晶構造パラメーター（Ｉｐ／Ｉｏ）が０．３＜Ｉｐ／Ｉｏ≦０．８である石油生コークスを原料とする電気二重層キャパシタ電極用炭素材。 - 特許庁

This optical element 10 has a diffractive structure 20 comprising a diffraction ring zone 21, and an optical path difference imparting structure 30 on an optical surface of the diffraction ring zone 21 for imparting the optical path difference to passing luminous flux of this ring zone.例文帳に追加

本発明に係る光学素子１０は、回折輪帯２１からなる回折構造２０と、回折輪帯２１の光学面に、この輪帯の通過光束に対して光路差を付与する光路差付与構造３０とを備える。 - 特許庁

A laminate structure of InP buffer layer 14, an active layer 16, a InP spacer layer 18 in the thickness of 200 nm, a GaInAs diffraction grating 20, and a InP clad layer 22 embedding the diffraction grating is provided on a InP substrate 12.例文帳に追加

ＩｎＰ基板１２上に、ＩｎＰバッファ層１４、活性層１６、膜厚２００ｎｍのＩｎＰスペーサ層１８、のＧａＩｎＡｓ回折格子２０、及び回折格子を埋め込んだＩｎＰクラッド層２２の積層構造を備える。 - 特許庁